| 简介 |
Vapor deposition shuttle takes the metal from a wire to be melted at a raised heating surface to flow into a cavity to be vaporized without splashing. The vapor deposition shuttle (1), in an assembly to apply a coating to a substrate in a processing chamber, is heated by a direct current passage. A cavity (2) holds a molten metal for deposition, using a metal wire (5) to be melted and vaporized. The shuttle has a raised heating surface (4) on a melting island (3) in the symmetrical center of the cavity, at a higher level than the base (6) of the cavity, held at a lower temperature than at the cavity base. The shuttle structure gives a flow of molten metal from the heating surface to the cavity base. The melting island is of a material with a higher electrical resistance than the remainder of the shuttle structure. The heating surface retains impurities in the molten metal. |
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