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METHOD AND DEVICE FOR PRODUCING SEMICONDUCTOR PARTICLE 发明申请

2023-10-24 3790 1154K 0

专利信息

申请日期 2025-06-30 申请号 JP2005022989
公开(公告)号 JP2006206406A 公开(公告)日 2006-08-10
公开国别 JP 申请人省市代码 全国
申请人 CLEAN VENTURE 21 KK
简介 PROBLEM TO BE SOLVED : To provide a method and a device for producing high purity semiconductor particles at a high speed by effectively exhausting impurity components generated in the process of producing semiconductor particles by a melt dropping method. SOLUTION : At least either a stage where a semiconductor material is heated and melted and a stage where a semiconductor melt is dropped into a vapor phase is performed while, inside a crucible or inside a jacket stored with the crucible, rare gas is fed from one side and is exhausted from the other side in succession. COPYRIGHT : (C)2006, JPO&NCIPI


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