| 申请日期 | 2026-03-13 | 申请号 | JP2000117771 |
| 公开（公告）号 | JP3801418B2 | 公开（公告）日 | 2006-07-26 |
| 公开国别 | JP | 申请人省市代码 | 全国 |
| 申请人 | NEOMAX CO LTD | ||
| 简介 | The invention is directed to a work having a vapor deposited film formed thereon from at least one metal selected from the group consisting of aluminum, titanium, zinc, tin, lead and bismuth. The vapor deposited film is formed by evaporating the at least one metal in a state in which a vapor deposition controlling gas has been supplied to at least zones near a material melting/evaporating source and the work within a treating chamber. | ||
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