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R-T-B SYSTEM PERMANENT MAGNET AND PLATED FILM 发明申请

2023-02-27 4900 120K 0

专利信息

申请日期 2025-06-25 申请号 JP2004373522
公开(公告)号 JP2006179800A 公开(公告)日 2006-07-06
公开国别 JP 申请人省市代码 全国
申请人 TDK CORP
简介 PROBLEM TO BE SOLVED : To provide an R-T-B system permanent magnet equipped with a plated film which is easily used for actual manufacturing of the R-T-B system permanent magnet and is effective for securing hardness. SOLUTION : The R-T-B system permanent magnet 1 comprises a magnet element assembly 2 which consists of a sintered material containing at least main phase crystal grains consisting of an R2T14B compound, where R is one or two or more rare earth elements containing Y and T is one or two or more transition metal elements containing Fe or Fe and Co as essentials, and a grain boundary phase containing more R than the main phase crystal grains; and the plating film 3 for coating the surface of the magnet element assembly 2 which meets 0.005


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