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Semiconductor photodetector with high reinforcement and manufacturing process 译文

2023-09-02 1230 214K 0

专利信息

申请日期 2025-07-08 申请号 DE60112726
公开(公告)号 DE60112726T2 公开(公告)日 2006-06-14
公开国别 DE 申请人省市代码 全国
申请人 ST MICROELECTRONICS SRL
简介 The high-gain photodetector (1) is formed in a semiconductor-material body (5) which houses a PN junction (13, 14) and a sensitive region (19) that is doped with rare earths, for example erbium (Er). The PN junction (13, 14) forms an acceleration and gain region (13, 14) separate from the sensitive region (19). The PN junction is reverse-biased and generates an extensive depletion region accommodating the sensitive region (19). Thereby, the incident photon having a frequency equal to the absorption frequency of the used rare earth crosses the PN junction (13-14), which is transparent to light, can be captured by an erbium ion in the sensitive region (19), so as to generate a primary electron, which is accelerated towards the PN junction by the electric field present, and can, in turn, generate secondary electrons by impact, according to an avalanche process. Thereby, a single photon can give rise to a cascade of electrons, thus considerably increasing detection efficiency.


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