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Electrical pumping of silicon for optical emission, endowed with rare ground connection 译文

2023-10-04 2810 130K 0

专利信息

申请日期 2025-07-15 申请号 DE69924906
公开(公告)号 DE69924906T2 公开(公告)日 2006-06-01
公开国别 DE 申请人省市代码 全国
申请人 IBM
简介 A structure having a p-n junction in a semiconductor having a first p-type region and a first n-type region along with a region located in the vicinity of the p-n junction that is doped with a rare-earth element. In addition, the structure includes a charge source coupled to one of the p- type region and n-type region for providing charge carriers to excite atoms of the rare-earth element. Also provided is a method for producing the structure that includes providing a bipolar junction transistor; doping a region in a collector of the transistor with a rare-earth element; and biasing the transistor to generate light emission from the rare-earth element doped region.


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