| 简介 |
PROBLEM TO BE SOLVED : To provide a ceramic member having corrosion resistance or durability against a halogen-based gas or a halogen-based plasma gas, hardly causing pollution in a semiconductor manufacturing apparatus and capable of keeping the quality stable for a long period in the apparatus aimed at the treatment of a wafer.
SOLUTION : In the ceramic member for the semiconductor manufacturing apparatus, at least a part of the member which is exposed to a corrosive gas such as the halogen-based gas or the halogen-based plasma gas comprises 70-98 wt.% oxide of a rare earth and 30-2 wt.% conductive ceramic and is constituted of a combined sintered body formed by dispersing the conductive ceramic particles having 0.03-5 μm average particle diameter in the oxide.
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