| 简介 |
PROBLEM TO BE SOLVED : To provide antireflection coating capable of fully restraining standing wave effect, even when the angle of incidence [!theta!]I for the exposure light incident on a resist layer has been enlarged.
SOLUTION : The multilayered antireflection coating film is employed upon exposing the resist layer in a liquid immersion exposing system, having a number of opening of more than 0.85 and provided with a multilayered structure of more than two layers. The film satisfies relations RS≤0.5%, RP≤0.5% and Rave≤0.5% within the range of 0≤n0×sin([!theta!]I)≤1.2, when the angle of incidence of exposure light incident on the resist layer [!theta!]I, the refractory index of atmosphere, through which the exposure light has passed before incident on the resist layer, is n0, the reflection factor of S-polarization component of exposure light reflected by the object to be irradiated is RS (unit : %), the reflection factor of P-polarization component of exposure light, reflected by the object to be irradiated, is RP (unit : %) and the average reflection factor of exposure light reflected by the object to be irradiated is Rave (unit : %).
COPYRIGHT : (C)2006, JPO&NCIPI |
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