| 申请日期 | 2026-04-16 | 申请号 | US10532802 |
| 公开（公告）号 | US20050287931A1 | 公开（公告）日 | 2005-12-29 |
| 公开国别 | US | 申请人省市代码 | 全国 |
| 申请人 | Hiroshi Saegusa; Fumio Imai; Katsura Ito | ||
| 简介 | A polishing slurry comprising an abrasive comprising as a basic ingredient rare earth oxides containing cerium oxide, which polishing slurry further comprises an anionic surfactant and a nonionic surfactant and has a pH value of at least 11. The polishing slurry is especially suitable for polishing a glass substrate for magnetic disc, and other substrates used in electronic field. | ||
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