| 简介 |
FIELD : electronic industry; production of profiled crystals from semiconductor materials and other materials used in electronic industry.SUBSTANCE : proposed method consists in growing profiled crystals from melt by drawing the seed holder and imparting rotation to seed holder and to molding agent with capillary zone for delivery of melt located between inner and outer curvilinear edges of working surface in form of spiral; the following relationship is satisfied : dR/dα≥0, where R and α are radius and angle of polar coordinate system with center at point of intersection of plane in which edges of working surface of molding agent and axes of its rotation lie. Molding agent may be so made that its working surface is located at angle relative to plane of its base. Molding agent may be made at gradual increase of molding surface above base. Proposed method may be used for growing crystals from rubin, sapphire, alumoyttrium garnet, composite eutectics refractory oxides, lithium niobate, molybdates of rare-earth metals and other substances of various forms, hollow parts inclusive in form of cone, sphere, rod (cylinder), ellipsoid at section in form of trochoid or any open curve at homogeneous structure.EFFECT : possibility of obtaining constant thickness of crystal or thickness changing according to definite law.5 cl, 10 dwg |
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