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POLISHING MEDIA, METALLIC WORK POLISHING METHOD AND MAGNETIC MATERIAL 发明申请

2023-11-09 1940 70K 0

专利信息

申请日期 2025-07-18 申请号 JP2004115832
公开(公告)号 JP2005297117A 公开(公告)日 2005-10-27
公开国别 JP 申请人省市代码 全国
申请人 SHINETSU CHEMICAL CO; SHINETSU MAGNET KK
简介 PROBLEM TO BE SOLVED : To provide polishing media for largely restraining generation of media powder being industrial waste, by providing a stable polishing quantity and superior surface processing when barrel polishing a metallic work. SOLUTION : A diamond abrasive grain 12 having the average particle size falling within a range of 10 μm to 200 μm is fixed by a plating film 13 to a surface of a core 11 having the average particle size of 1 mm to 20 mm. The core 11 is composed of at least one kind of construction material of WC, TiC, aluminum, titanium or rare earth metal (including yttrium), and a specific gravity of the polishing media 10 is set to 4 or less. When barrel polishing by inputting a polishing liquid suspending these polishing media 10 in a liquid medium and the metallic work in the barrel, due to being extremely low in an abrasion level of the polishing media 10, the stable polishing quantity and the superior surface processing are provided, and generation of media powder being the industrial waste can be largely restrained. COPYRIGHT : (C)2006, JPO&NCIPI


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