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SILICIC STREAM-PROOF FILM, HYDROGEN GAS SEPARATION MATERIAL USING THE SAME, AND PRODUCTION METHOD 发明申请

2023-03-01 2700 163K 0

专利信息

申请日期 2025-06-26 申请号 JP2004090602
公开(公告)号 JP2005270887A 公开(公告)日 2005-10-06
公开国别 JP 申请人省市代码 全国
申请人 JAPAN FINE CERAMICS CT
简介 PROBLEM TO BE SOLVED : To provide a silicic film having steam-proofness in high temperature and steam atmosphere, a hydrogen gas separation material using the film, and production methods of them. SOLUTION : The steam-proof film contains R (a rare earth element), Si, and O and has Si-O bond. The film can suppress a permeation of carbon monoxide gas and can be used as the hydrogen separation film. The production method of the steam-proof film comprises steps of applying a solution containing a compound containing R and an alkoxysilane compound for forming a film and heat-heating the film. After the heating treatment, the film may be heated in atmosphere containing steam. The hydrogen gas separation material comprises a porous substrate and the steam-proof film formed in one face side of the porous substrate. The production method of the hydrogen gas separation material comprises applying a solution containing a compound containing R and an alkoxysilane compound for forming a film and heating the film. COPYRIGHT : (C)2006, JPO&NCIPI


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