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MAGNETO-OPTICAL ALLOY SPUTTER TARGET 发明申请

2023-03-30 3840 142K 0

专利信息

申请日期 2025-06-25 申请号 JP2004312470
公开(公告)号 JP2005171380A 公开(公告)日 2005-06-30
公开国别 JP 申请人省市代码 全国
申请人 MATERIALS RESEARCH CORP
简介 PROBLEM TO BE SOLVED : To provide a target with which a layer of a magneto-optical recording medium having improved characteristics can be steadily formed by sputtering and a method of producing the same. SOLUTION : The magneto-optical sputter target has a composition comprising at least one rare earth element and at least one transition metal, with a structure which includes a transition metal constituent and a finely mixed alloy constituent of a rare earth phase and a rare earth/transition metal intermetallic compound. The structure of the target contains a minimum of the intermetallic compound. The method of producing the sputter target includes a step of mixing particles of the transition metal constituent (preferably only alloyed transition metals) with particles of the finely mixed alloy to produce a powder blend and a step of subjecting the powder blend to a pressing operation in an oxidizing inhibiting environment for a time and at a temperature and pressure which minimizes the rare earth/transition metal intermetallic compound content of the target.


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