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Silicon nitride thin film for optical device and fabrication method thereof 发明申请

2023-07-21 2130 210K 0

专利信息

申请日期 2025-07-07 申请号 KR1020030097049
公开(公告)号 KR1020050065889A 公开(公告)日 2005-06-30
公开国别 KR 申请人省市代码 全国
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
简介 PURPOSE : A silicon nitride thin film for an optical device is provided to improve light emitting efficiency of a rare earth element by exciting a rare earth element by an amorphous silicon quantum dot having higher light emitting efficiency than a crystalline silicon nano dot. CONSTITUTION : An amorphous silicon quantum dot and a rare earth element are distributed together in a silicon nitride thin film for an optical device. The rare earth element is excited by the amorphous silicon quantum dot to emit light. The rare earth element is Er, Eu, Gd, Tb or Yb. The amorphous silicon quantum dot is 1-5 nanometer in size. © KIPO 2006


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