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Magneto-optical alloy sputter 发明授权

2023-07-24 1720 151K 0

专利信息

申请日期 2025-06-29 申请号 JP07515663
公开(公告)号 JP3662251B2 公开(公告)日 2005-06-22
公开国别 JP 申请人省市代码 全国
申请人 MATEIARIARUZU RISAACHI CORP
简介 A magneto-optical sputter target having a composition comprising at least one rare earth element and at least one transition metal, with a structure which includes a transition metal constituent and a finely mixed alloy constituent of a rare earth phase and a rare earth/transition metal intermetallic compound. The structure of the present target contains a minimum of the intermetallic compound. A method of producing the present sputter target includes mixing particles of the transition metal constituent (preferably only alloyed transition metals) with particles of the finely mixed alloy to produce a powder blend and subjecting the powder blend to a pressing operation in an oxidizing inhibiting environment for a time and at a temperature and pressure which minimizes the rare earth/transition metal intermetallic compound content of the target.


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