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Method of manufacturing cerium-based polishing agent 发明授权

2023-04-18 2630 866K 0

专利信息

申请日期 2025-09-15 申请号 US10433967
公开(公告)号 US6905527B2 公开(公告)日 2005-06-14
公开国别 US 申请人省市代码 全国
申请人 Terunori Ito; Hiroyuki Watanabe; Kazuya Ushiyama; Shigeru Kuwabara; Yoshitsugu Uchino
简介 This invention aims to provide a method of manufacturing a cerium-based abrasive containing coarse particles in lower concentration and having higher polishing ability and excellent cleanability for a polished face. Further, the present invention provides a method of manufacturing a cerium-based abrasive, including the steps of pulverizing a raw material, roasting a raw material after pulverization and disintegrating a raw material after roasting, in which a cerium-based rare earth carbonate or a mixture of a cerium-based rare earth carbonate and a cerium-based rare earth oxide is used as a cerium-based abrasive raw material, and the step of pulverizing a raw material pulverizes a raw material through heating while the material is kept immersed in aqueous solution.


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