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Electric pumping of rare-earth-doped silicon for optical emission 发明授权

2023-09-12 3840 493K 0

专利信息

申请日期 2026-03-15 申请号 EP99301326
公开(公告)号 EP945938B1 公开(公告)日 2005-04-27
公开国别 EP 申请人省市代码 全国
申请人 International Business Machines Corporation
简介 A structure having a p-n junction in a semiconductor having a first p-type region and a first n-type region along with a region located in the vicinity of the p-n junction that is doped with a rare-earth element. In addition, the structure includes a charge source coupled to one of the p- type region and n-type region for providing charge carriers to excite atoms of the rare-earth element. Also provided is a method for producing the structure that includes providing a bipolar junction transistor; doping a region in a collector of the transistor with a rare-earth element; and biasing the transistor to generate light emission from the rare-earth element doped region.


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