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Continuous vacuum processing device 发明授权

2023-03-02 4970 361K 0

专利信息

申请日期 2025-06-26 申请号 KR1019970008587
公开(公告)号 KR100487010B1 公开(公告)日 2005-04-25
公开国别 KR 申请人省市代码 全国
申请人 PANASONIC ELECTRIC WORKS CO LTD; PANASONIC CORPORATION
简介 More than two pressure reducing chambers 6 to 9 are located on both the upstream and the downstream of vacuum processing housings 11 and 12. Each of the pressure reducing chambers 6 to 9 includes a film conveying means 30, a vacuum exhausting means, and a gate valve 20 provided with a resilient member for closely holding down the running film 1 to seal off the vacuum state of a belt-like passage of the gate valve 20. As the pressure reducing chambers 6 to 9 are protected with their specific gate valve belt-like passage arrangement from reduction of the vacuum state and located respectively on the upstream and downstream sides of the vacuum processing units 11 and 12, the vacuum state in the continuous vacuum processing apparatus will be maintained to a desired level. While the running film 1 is being conveyed, the gate valves 20 at the first and second stages are actuated alternately for opening and closing after vacuum evacuation.


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