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GAS SUPPLY METHOD AND APPARATUS 发明申请

2023-04-19 3970 101K 0

专利信息

申请日期 2025-09-13 申请号 JP2003338555
公开(公告)号 JP2005103400A 公开(公告)日 2005-04-21
公开国别 JP 申请人省市代码 全国
申请人 TAIYO NIPPON SANSO CORP
简介 PROBLEM TO BE SOLVED : To provide a gas supply method and apparatus, whereby a rare gas (e.g. krypton, xenon, or neon) in an exhaust gas exhausted from a facility for mixing and using the rare gas and an inert gas (e.g. argon or helium) is efficiently recovered and supplied as a gas mixture having a desired composition to the facility. SOLUTION : The gas supply method comprises the following : into a vacuum exhaust means of a gas mixture-using facility for using a gas mixture of a rare gas (e.g. xenon, krypton, or neon) and an inert gas (e.g. helium or argon), an inert gas the same as that in the gas mixture is introduced as a seal gas; an exhaust gas from the vacuum exhaust means is introduced into a storage tank; a part of the exhaust gas in the storage tank is supplied as a gas mixture to the gas mixture-using facility; and the residue of the exhaust gas in the storage tank is introduced into a pressure-swing adsorption and separation means filled with an adsorbent hardly adsorbing the inert gas to thereby separate the inert gas and exhaust it out of the system.


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