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METHOD FOR MANUFACTURING ULTRA-THIN FILM 发明申请

2023-08-16 3630 985K 0

专利信息

申请日期 2025-08-16 申请号 JP2003334683
公开(公告)号 JP2005097693A 公开(公告)日 2005-04-14
公开国别 JP 申请人省市代码 全国
申请人 TOYAMA PREFECTURE
简介 PROBLEM TO BE SOLVED : To manufacture a thin film having a smooth laminar structure which has been heretofore difficult to manufacture in a conventional method by suppressing the island structure produced when the film is extremely thin. SOLUTION : The thin film having the laminar structure of a smooth surface, an underlayer thereof and a steep interface is manufactured by depositing the film and bombarding the surface region of a depth of ≤20 nm of the deposited film with the ions of rare gas which has an energy within a range from 100 to 300 eV and is heavier than Ne.


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