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Solid-state excimer devices and processes for producing same 检索报告

2023-08-03 4760 200K 0

专利信息

申请日期 2025-07-08 申请号 EP00123268
公开(公告)号 EP1096578A3 公开(公告)日 2005-04-13
公开国别 EP 申请人省市代码 全国
申请人 Okada Fumio
简介 Useful, new electronic devices are disclosed which utilize the huge polarization and electric double layer generated by excimer formation reaction in solid thin host films doped with excimer forming atoms (rare-gases and halogens : hereinafter, the parent atoms of excimers) at ambient temperature and pressure. A fundamental type of these devices is a single layer solid-state excimer device, which consists of a thin film (3) fabricated by selecting a material from insulating metal oxides, at least one dopant from the parent rare-gas atoms (Ar, Kr and Xe) of excimers, and at least one dopant from parent halogen atoms (F, Cl, Br and I) of excimers. The dopants can be doped in the thin film during its fabrication process. Upper and lower electrodes (4, 2) can be added to the thin film when they are needed, and practical devices can be obtained by fabricating the electrodes and thin film together on a substrate (1), which can be useful in ferroeletric memory applications.


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