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ELECTROSTATIC CHUCK 发明申请

2023-07-27 4790 105K 0

专利信息

申请日期 2025-06-27 申请号 JP2003325023
公开(公告)号 JP2005093723A 公开(公告)日 2005-04-07
公开国别 JP 申请人省市代码 全国
申请人 KYOCERA CORP
简介 PROBLEM TO BE SOLVED : To provide an electrostatic chuck wherein an insulating film on an electrode for attraction is not broken dielectrically and of which the response characteristics of attraction and releasing is superior. SOLUTION : An electrode 4 for attraction is provided on one main surface of a glass substrate 3, and an insulating film 2 whose upper surface is an attraction plane to place a wafer is provided on the electrode 4 for attraction. The insulating film 2 is made of a uniform amorphous ceramic containing aluminum oxide, silicon oxide, yttrium oxide, yttrium aluminum oxide, or oxide of rare-earth element, or aluminum nitride, silicon nitride.


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