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CERIUM BASED POLISHING MATERIAL AND RAW MATERIALS THEREFOR 发明申请

2023-09-13 4560 1968K 0

专利信息

申请日期 2025-08-25 申请号 KR1020057003321
公开(公告)号 KR1020050031111A 公开(公告)日 2005-04-01
公开国别 KR 申请人省市代码 全国
申请人 MITSUI MINING SMELTING CO LTD
简介 A cerium-based polishing material which comprises cerium oxide (CeO 2), lanthanum oxide (La2O3) and neodymium oxide(Nd2O3), as rare earth element oxides, and also fluorine (F), characterized in that it has a proportion in weight of the total rare earth elements in terms of oxide (TREO) of 90 wt %% or more, a proportion of the weight of cerium oxide in the weight of the total rare earth elements in terms of oxide (CeO2/TREO) is 50 to 65 wt %%, and a proportion of the weight of neodymium oxide in the weight of the total rare earth elements in terms of oxide (Nd2O3/TREO) is 10 to 16 wt %%. The cerium-based polishing material has excellent polishing characteristics such as the reduction in the generation of flaws and also exhibits enhanced polishing speed. © KIPO & WIPO 2007


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