MULTI-LAYER PLASMA RESISTANT COATING BY ATOMIC LAYER DEPOSITION

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Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a rare earth metal-containing oxide layer and uniformly covers features, such as those having an aspect ratio of about 3 : 1 to about 300 : 1.