FILM DEPOSITION METHOD

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PROBLEM TO BE SOLVED : To provide a film deposition method capable of depositing a carbon film at high productivity, while suppressing adhesion of foreign substances to a material on which the film is deposited. SOLUTION : A target 31 made of carbon, adhesion preventive plates 5u, 5d for preventing sputtered particles from adhering to the internal surface of a vacuum chamber 1, and a material S on which a film is deposited are arranged in the vacuum chamber 1. In a film deposition method, a rare gas is introduced in the vacuum chamber as a sputtering gas and sputtering is practiced by supplying power to the target to deposit a carbon film on the surface of the material S and the adhesion preventive plates. The method includes a process to form a carbon nitride layer by introducing a nitrogen-containing gas as another sputtering gas together with the rare gas during the film deposition processing to the plurality of materials. SELECTED DRAWING : Figure 1 COPYRIGHT : (C)2018, JPO&INPIT