POLISHING MATERIAL FOR SYNTHETIC QUARTS GLASS SUBSTRATE AND METHOD FOR POLISHING SYNTHETIC QUARTS GL

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The present invention is a polishing material for synthetic quarts glass substrates which comprises abrasive grains and water, characterized in that the abrasive grains comprise ceria particles as base particles and, fixed to the surfaces of the base particles, particles of a composite oxide including cerium and at least one rare-earth element selected from among trivalent rare-earth elements excluding cerium. Due to this, a polishing material for synthetic quarts glass substrates which has a high polishing rate and can be sufficiently inhibited from causing polishing defects is provided.