PLASMA RESISTANT COATING FILM AND FORMATION METHOD THEREFOR

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The present invention relates to a plasma resistant coating film and a formation method therefor and, more specifically, to a plasma resistant coating film and a formation method therefor, the plasma resistant coating film being capable of minimizing an open channel and an open pore of a coating layer by means of double sealing through aerosol deposition and hydration processing after thermal spray-coating a first rare-earth metal compound, such that a chemical resistant property and plasma corrosion resistance caused by a dense rare-earth metal compound coating film can be simultaneously obtained.