METHOD FOR MODIFYING SURFACE OF SUBSTRATE USING RARE EARTH OXIDE THIN FILM

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The present invention refers to rare earth oxide film using surface modification method relates to, plasma atomic layer deposition method (PE non-ALD) provided using inorganic (Si, SiO2 , Pt) substrate rare earth oxide (Y2 O3 ) By depositing a predetermined thickness, and maintaining the surface hydrophobic stably at higher temperature, and a thin-film during growing of PE non-ALD process can minimize damage to the substrates, specific lower substrate deposition surface according to the hydrophobic properties of the final hydrophobic properties inclination surface modification method using thin film of rare earth oxide, and the hydrophobic surface modified substrate are disclosed.