Photoresist composition, a resist pattern forming method, polymer and compound

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PROBLEM TO BE SOLVED : To provide a photoresist composition excellent in focal depth and defect suppressing property.SOLUTION : The photoresist composition comprises a first polymer having a first structural unit expressed by formula (1), and an acid generator. In formula (1), Rrepresents a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms; in Rand R, Rrepresents a monovalent hydrocarbon group having 1 to 20 carbon atoms and Rrepresents a divalent connecting group having 1 to 20 carbon atoms, or Rand Rare coupled to represent a cyclic structure having 3 to 20 members constituted together with a carbon atom to which both groups are bonded.