Radiation-sensitive resin composition, the resist pattern formation method, the radiation-sensitiv

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PROBLEM TO BE SOLVED : To provide a radiation-sensitive resin composition which is excellent in LWR performance, resolution, rectangularity of a cross-sectional shape, and depth of focus.SOLUTION : The radiation-sensitive resin composition of the present invention contains a polymer having a first structural unit containing an acid-dissociable group, and a first radiation-sensitive acid generator. The first radiation-sensitive acid generator comprises a compound represented by formula (1). In the formula (1), Rand Rare each independently a hydrogen atom, a fluorine atom, a 1-20C monovalent hydrocarbon group, or a 1-20C monovalent fluorinated hydrocarbon group, provided that at least one of Rand Ris a fluorine atom or a fluorinated hydrocarbon group; and Rand Rare each independently a hydrogen atom or a 1-20C monovalent hydrocarbon group.