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PROBLEM TO BE SOLVED : To provide a method for manufacturing a piezoelectric structure that reduces the surface roughness Ra of a piezoelectric film layer while simplifying the process of forming a piezoelectric film layer.
SOLUTION : In STEP 5, a second intermediate plate 27 having a piezoelectric film layer 23 formed on a surface side of a lower electrode layer 14 is manufactured. In STEP 6, a surface of the second intermediate plate 27 is irradiated with a gas cluster ion beam Ib of GCIB of a mixed gas of a fluorine compound gas and a rare gas to flatten the surface. In STEP 7, an upper electrode layer is formed on a surface of the piezoelectric film layer 23.
SELECTED DRAWING : Figure 2
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