METHOD FOR PRODUCTION OF RE-EMITTING TEXTURED THIN FILMS BASED ON AMORPHOUS HYDROGENATED SILICON WIT

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FIELD : physics, instrumentation. SUBSTANCE : invention refers to optoelectronic technology and can be used to create textured re-emitting coatings for application in thin film solar cells. The method for production of re-emitting textured thin films based on hydrogenated amorphous silicon with silicon nanocrystals comprises preparation of thin films of hydrogenated amorphous silicon, which are treated in the air atmosphere by femtosecond laser pulses with a central emission wavelength of 500-1100 nm, pulse repetition frequency of 50-500 kHz, pulse duration of 100-500-fs and laser pulse energy density of 260-500 mJ/cm2. EFFECT : invention allows formation of re-emitting textured thin films, effectively absorbing the ultraviolet portion of solar spectrum with its subsequent conversion into visible light. 5 cl, 5 dwg