The photosensitive resin composition, a pattern formation method, a color filter, and display dev

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PROBLEM TO BE SOLVED : To provide a photosensitive resin composition capable of forming a pattern excellent in straight advancing property and adhesiveness with a small amount of exposure while containing a light shielding agent, and to provide a pattern forming method using the photosensitive resin composition, a color filter formed using the photosensitive resin composition, and a display device using the color filter.SOLUTION : A photosensitive resin composition contains a photopolymerizable compound, a photopolymerization initiator, a compound represented by formula (1), and a light shielding agent. In the formula, Rand Reach independently represent a hydrogen atom or an organic group, but at least one represents an organic group. Rand Rmay be linked with each other to form a cyclic structure, and may include a bond of hetero atoms. Rrepresents a single bond or an organic group. Rto Reach independently represent a hydrogen atom, an organic group or the like, but Rand Rare not a hydroxyl group. Rrepresents a hydrogen atom or an organic group.