Salt, acid generator, resist composition and a manufacturing method of a resist pattern

文件类型：PDF文档
文件大小：761K
PROBLEM TO BE SOLVED : To provide a salt to be used for a resist composition from which a negative resist pattern with excellent resolution and/or CD uniformity (CDU) can be produced.SOLUTION : The salt is expressed by formula (I). In formula (I), Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, in which a methylene group included in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, and a hydrogen atom included in the saturated hydrocarbon group may be replaced by a fluorine atom; Rand Reach independently represent an aliphatic hydrocarbon group having 1 to 6 carbon atoms, or Rand Rare bonded to each other together with a carbon atom bonded to both to form a ring having 5 to 20 carbon atoms; the aliphatic hydrocarbon group and the ring may have a substituent; and Zrepresents an organic cation.