POLISHING LIQUID, POLISHING LIQUID SET, AND METHOD FOR POLISHING SUBSTRATE

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PROBLEM TO BE SOLVED : To provide a polishing liquid capable of polishing an insulating material at a high polishing speed and sufficiently suppressing the polishing speed of a stopper material. SOLUTION : The polishing liquid contains a liquid medium, abrasive grains containing a hydroxide of a tetravalent metal element, a polyoxyalkylene compound, a cationic polymer, and a ≥4C alcohol. The hydroxide of the tetravalent metal element is at least one selected from the group consisting of hydroxides of rare earth metal elements and a hydroxide of zirconium. The content of the polyoxyalkylene compound is 0.02 mass% or more based on the total mass of the polishing liquid. COPYRIGHT : (C)2016, JPO&INPIT