Components for plasma etching equipment with improved plasma resistance and their manufacturing meth

文件类型：PDF文档
文件大小：2008K
The present invention relates to a member for a plasma etching device and a method of manufacturing the same, and more particularly to a member for a plasma etching device, which is improved in plasma resistance through deposition of a rare-earth metal thin film and surface heat treatment and the optical transmittance of which is maintained, thus being useful as a member for analyzing the end point of an etching process, and a method of manufacturing the same.