分享好友 知识库首页 频道列表

The protective film material and resist pattern forming method

2025-06-18 13:512600下载
文件类型：PDF文档
文件大小：1316K
PROBLEM TO BE SOLVED : To provide a resist protective film material which can prevent formation of a T-shape profile in a resist pattern due to amine contamination in air and which has a sensitizing effect on a resist film and thereby can improve the sensitivity of the resist film.SOLUTION : The resist protective film material comprises a polymeric compound, as a base resin, having a repeating unit derived from a substituted or unsubstituted styrene boronic acid expressed by formula (1). In the formula, Rrepresents H, an alkyl group or a halogen atom; Rand Rrepresent H, an alkyl group or an aralkyl group, or Rand Rmay be bonded to form a ring together with -O-B-O-, and in the ring, Rand Rare an alkylene group, an alkenylene group or an aralkylene group which may have an ether group, a thiol group or a hydroxy group; and p satisfies 0
反对 0
举报 0
收藏 0
打赏 0
评论 0