The method for producing the thin film sputtering target and permanent magnet

文件类型：PDF文档
文件大小：513K
PROBLEM TO BE SOLVED : To provide a sputtering target for a permanent magnet thin film which can improve the magnetic properties of a permanent magnet thin film such as an Nd-Fe-B based permanent magnet thin film, and a method for producing the same. SOLUTION : The sputtering target is composed of a sintered compact represented by a compositional formula in atomic ratio of RxT100-x-yMy(R denotes at least one kind among rare earth elements, wherein Nd and/or Pr is necessarily included; T denotes at least one kind among transition elements, wherein Fe is necessarily included; and M denotes B or B and C, wherein 50 atomic%≤B/M is satisfied), and in which x and y satisfy 17≤x≤20, and 7≤y≤10, and having an oxygen content of ≤1, 500 ppm. COPYRIGHT : (C)2013, JPO&INPIT