Salt and resist compsn.

文件类型：PDF文档
文件大小：1120K
PROBLEM TO BE SOLVED : To provide a salt for an acid generator of a resist composition capable of forming a pattern having excellent resolution.SOLUTION : The salt is expressed by formula (I). In the formula, R, R, Rand Rare each independently a 1-6C aliphatic hydrocarbon group or Rand R, and Rand Rare each independently bonded together to form a 5-20C ring; Rand Rare each a fluorine atom or 1-6C perfluoroalkyl; Xis a bivalent 1-17C saturated hydrocarbon group, wherein the hydrogen atom in the bivalent saturated hydrocarbon group may be substituted with a fluorine atom, and -CH- in the bivalent saturated hydrocarbon group may be substituted with -O- or -CO-; and Zis an organic counter ion.