AQUEOUS ALKALINE COMPOSITIONS AND METHOD FOR TREATING THE SURFACE OF SILICON SUBSTRATES

文件类型：PDF文档
文件大小：308K
An aqueous alkaline composition for treating the surface of silicon substrates, the said composition comprising : (A) a quaternary ammonium hydroxide; and (B) a component selected from the group consisting of water-soluble acids and their water-soluble salts of the general formulas (I) to (V) : (R1-S03-)nXn+ (I), R-P032- (Xn+)3-n (II); (RO-S03-)nXn+ (III), RO-P032- (Xn+)3-n (IV), and [(RO)2P02-] nXn+ (V); wherein the n = 1 or 2; X is hydrogen, ammonium, or alkaline or alkaline-earth metal; the variable R1 is an olefinically unsaturated aliphatic or cycloaliphatic moiety and R is R1 or an alkylaryl moiety; and (C) a buffer system, wherein at least one component other than water is volatile; the use of the composition for treating silicon substrates, a method for treating the surface of silicon substrates, and methods for manufacturing devices generating electricity upon the exposure to electromagnetic radiation.