ENVIRONMENTAL BARRIER FOR A REFRACTORY SUBSTRATE CONTAINING SILICON

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The invention relates to a method for protecting a substrate (10), in which at least one portion adjacent to a surface is made of a refractory material containing silicon, during high-temperature use in an oxidising, humid environment, which consists of forming a boron-free environmental barrier on the surface of the substrate, having at least one layer (22) essentially made of a system of oxides formed by at least one oxide of a rare earth element, silica and alumina and which is capable of self-healing with the sustained presence of at least one solid phase in a temperature range of up to at least around 1400°C.