Al ALLOY THIN FILM, LIGHT EMITTING ELEMENT AND SPUTTERING TARGET

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An Al alloy thin film according to one embodiment of the present invention is directly or indirectly laminated on a substrate that has a refractive index of from 1.5 to 2.0 (inclusive) and has an average film thickness of from 50 nm to 2, 000 nm (inclusive), while containing a rare earth element. This Al alloy thin film is configured such that : the maximum crystal grain size of intermetallic compounds of the rare earth element is 300 nm or less, said intermetallic compounds being present in a region that is within ± 20% of the thickness of the Al alloy thin film using the center in the thickness direction as a base line; the intermetallic compounds are present in a dispersed state, with the distance between adjacent intermetallic compounds being 2, 000 nm or less; and the reflectance from the substrate side is 60% or more.