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Fabrication of new forms of rare-earth oxides, rare-earth nitrides and rare-earth phosphides is disclosed. Further, ternary compounds composed of binary (rare-earth oxides, rare-earth nitrides and rare-earth phosphides) mixed with silicon and or germanium to form compound semiconductors. The presented growth techniques and material system can be applied to silicon electronics, opto-electronic, magneto-electronics and magneto-optics devices.