SPUTTERING TARGET AND METHOD FOR PRODUCTION THEREOF

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PROBLEM TO BE SOLVED : To provide a high density target having extremely fine and uniform structure manufactured with the sintering method, in place of a conventional bulk metal glass produced by the quenching of a molten metal, which has a coarse crystal structure and requires a high cost for its production. SOLUTION : Disclosed is a sintered sputtering having a structure where the average crystallite size is 1 nm to 50 nm and comprise an alloy having a three-component system or greater containing as its primary component, at least one element selected from among Zr, Pd, Cu, Co, Fe, Ti, Mg, Sr, Y, Nb Mo, Tc, Ru, Rh, Ag, Cd, In, Sn, Sb, Te and a rare earth metal. The target is manufactured by sintering atomized powder. COPYRIGHT : (C)2010, JPO&INPIT