SPUTTERING TARGET AND METHOD FOR PRODUCTION THEREOF

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PROBLEM TO BE SOLVED : To provide a high density target having an extremely fine and uniform structure manufactured with a sintering method, in place of the conventional bulk metal glass produced by quenching of a molten metal, which has a coarse crystal structure and requires a high cost for its production. SOLUTION : A sintered sputtering target which is amorphous and has a structure where the average crystallize size is ≤50 nm and preferably comprises an alloy having a three-component system or greater containing, as its primary component, at least one element selected from among Zr, Pd, Cu, Co, Fe, Ti, Mg, Sr, Y, Nb, Mo, Tc, Ru, Rh, Ag, Cd, In, Sn, Sb, Te and a rare earth metal. This target is manufactured by sintering atomized powder. COPYRIGHT : (C)2010, JPO&INPIT