Mo SPUTTERING TARGET MATERIAL

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PROBLEM TO BE SOLVED : To provide an Mo sputtering target material having excellent plastic workability in a low temperature region. SOLUTION : The Mo sputtering target material has a composition consisting of, by mass, 1 to 100 ppm of one or more elements selected from rare earth elements and the balance Mo with inevitable impurities. As to the rare earth elements, it is preferable to select either or both of La and Ce. Further, in order to obtain the effects of the rare earth elements with more certainty, it is preferable to minimize gas components, such as N and O, and it is desirable to regulate the contents of N and O to ≤50 ppm and ≤500 ppm, respectively, and also to regulate the total content of N and O to ≤500 ppm. COPYRIGHT : (C)2008, JPO&INPIT