Barrier layer and method of supressing diffusion during processing of semiconductor devices

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Etching process for removing material from semiconductor wafers comprises preparing a semiconductor wafer as substrate, providing an etching signal layer (2) on sections of the substrate surface, providing a process layer (3) on sections of the etching signal layer, removing sections of the process layer, producing an etching signal during exposure of the removed sections of the etching signal layer lying below the process layer, and stopping the etching process depending on the etching signals. The etching signal layer is formed by sequential gas phase deposition or molecular beam epitaxy as dielectric layer made from a metal oxide or rare earth oxide. An Independent claim is also included for an etching signal layer.