SUBSTRATE TREATMENT DEVICE

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PROBLEM TO BE SOLVED : To provide a substrate treatment device capable of treating a substrate using a dilute medical liquid of which the concentration is adjusted precisely. SOLUTION : A first mixing section 14 mixes a fluoric acid undiluted solution (for example, having a concentration of 49 wt.%) supplied from a fluoric acid tank 30 and DIW supplied from a DIW supply source to generate a rare-hydrofluoric acid (for example, having a concentration of 2.3 wt.%). A second mixing section 15 mixes the rare-hydrofluoric acid generated by the first mixing section 14 with the DIW supplied from the DIW supply source to generate a rare-hydrofluoric acid (for example, having 0.11 wt.%). A third mixing section 16 mixes the rare-hydrofluoric acid generated by the second mixing section 15 with the DIW supplied from the DIW supply source to generate a rare-hydrofluoric acid (for example, having 0.005 wt.%). COPYRIGHT : (C)2009, JPO&INPIT