The protective film vapor deposition material for FPD and its manufacturing method

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PROBLEM TO BE SOLVED : To provide a deposition material capable of film formation having a small, stable and uniform film thickness distribution in a wide area by reducing a degassing exhaust processing time immediately after installing it in a vessel for vacuum film formation. ŽSOLUTION : This deposition material for a protective film for an FPD is formed of a polycrystal 11, a sintered body or a single crystal having a surface covered with a sulfated substance layer and/or sulfide layer 12. The polycrystal 11, the sintered body or the single crystal is formed of any of MgO, CaO, SrO, BaO, an alkaline earth composite oxide, a rare earth oxide, or a composite oxide of an alkaline earth oxide and a rare earth oxide; and the sulfated substance layer and/or the sulfide layer 12 are/is obtained by a reaction of a gaseous sulfation agent and/or a sulfurization agent with any of MgO, CaO, SrO, BaO, the alkaline earth composite oxide, the rare earth oxide, or the composite oxide of an alkaline earth oxide and a rare earth oxide. ŽCOPYRIGHT : (C)2005, JPO&NCIPI Ž