CERIUM-BASED POLISHING MATERIAL

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PROBLEM TO BE SOLVED : To provide a high-purity cerium-based polishing material having a high cerium oxide content, and providing an improved polishing rate. SOLUTION : The cerium-based polishing material having ≥90 mass% content of the cerium oxide based on the total rare earth oxide (TREO) contains 0.01-2.0 mass% of at least one kind of specific elements selected from Ti and the group 5 to 12 elements having ≤80 atomic number based on the total amount of the polishing material. COPYRIGHT : (C)2007, JPO&INPIT